A new technical paper titled “Enhanced Edge Etching Resistance and EUV Lithographic Performance of a Tin-Oxide Photoresist ...
Characterizing Reasoning LLM Deployment on Edge GPUs” was published by researchers at NVIDIA. Abstract “Edge intelligence ...
A new technical paper titled “The van der Waals Gap: a Hidden Showstopper in Semiconductor Device Scaling” was published by ...
A new technical paper titled “Large-scale crossbar arrays based on three-terminal MoS2 memtransistors” was published by ...
Keysight’s Elif Liebert checks out the Megawatt Charging System (MCS), a new charging standard for heavy-duty electric ...
But to increase adoption, formal tools have to lower barriers and make it possible for a wider group of people to be able to deploy successfully. LLMs may help.
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